发明名称 |
Liquid crystal display cell transparent electrode mfr. - includes heat treatment in nitrogen atmos. to increase laser absorption |
摘要 |
<p>The electrode is formed by applying a transparent conductive layer via cathode sputtering on a transparent substrate, before subjecting it to heat treatment in a nitrogen atmos. Pref. the cathode sputtering is carried out in a reduced argon atmos. with the electrode layer comprising equal parts of indiun and tin. The heat treatment is carried out at a temp of 400 deg.C which is attained over a period of about 30 minutes, with the subsequent cooling down taking between 1 and 3 hours. The characteristics of the electrode can be varied by controlling the heating and cooling down phases of the heat treatment process. The latter allows a refractive index of 2.3 to be obtained for the electrode, so that it absorbs about 50 per cent of the energy of a YAG laser used to inscribe the display information.</p> |
申请公布号 |
FR2477730(A1) |
申请公布日期 |
1981.09.11 |
申请号 |
FR19800005195 |
申请日期 |
1980.03.07 |
申请人 |
THOMSON CSF |
发明人 |
MICHEL HARENG, SERGE LE BERRE ET MAURICE LE GALGUEN;BERRE SERGE LE;GALGUEN MAURICE LE |
分类号 |
C03C17/245;C23C14/00;C23C14/08;C23C14/58;G02F1/1343;H01L31/18;(IPC1-7):02F1/133 |
主分类号 |
C03C17/245 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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