发明名称 Method for Validating Measurement Data
摘要 A method includes receiving, into a measurement tool, a substrate having a material feature, wherein the material feature is formed on the substrate according to a design feature. The method further includes applying a source signal on the material feature by using a source in the measurement tool having a tool setting parameter, collecting a response signal from the material feature by using a detector in the measurement tool to obtain measurement data, and with a computer connected to the measurement tool, calculating a simulated response signal from the design feature using the tool setting parameter. The method further includes, with the computer, in response to determining that a difference between the collected response signal and the simulated response signal exceeds a predetermined value, causing the measurement tool to re-measure the material feature.
申请公布号 US2016320183(A1) 申请公布日期 2016.11.03
申请号 US201615210699 申请日期 2016.07.14
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 Chiu Chui-Jeng;Lo Jen-Chieh;Cheng Ying-Chou;Liu Ru-Gun
分类号 G01B15/04;H01J37/28 主分类号 G01B15/04
代理机构 代理人
主权项 1. A method comprising: receiving, into a measurement tool, a substrate having a material feature, wherein the material feature is formed on the substrate according to a design feature; applying a source signal on the material feature by using a source in the measurement tool having a tool setting parameter; collecting a response signal from the material feature by using a detector in the measurement tool to obtain measurement data; with a computer connected to the measurement tool, calculating a simulated response signal from the design feature using the tool setting parameter; and with the computer, in response to determining that a difference between the collected response signal and the simulated response signal exceeds a predetermined value, causing the measurement tool to re-measure the material feature.
地址 Hsin-Chu TW