发明名称 |
Method for Validating Measurement Data |
摘要 |
A method includes receiving, into a measurement tool, a substrate having a material feature, wherein the material feature is formed on the substrate according to a design feature. The method further includes applying a source signal on the material feature by using a source in the measurement tool having a tool setting parameter, collecting a response signal from the material feature by using a detector in the measurement tool to obtain measurement data, and with a computer connected to the measurement tool, calculating a simulated response signal from the design feature using the tool setting parameter. The method further includes, with the computer, in response to determining that a difference between the collected response signal and the simulated response signal exceeds a predetermined value, causing the measurement tool to re-measure the material feature. |
申请公布号 |
US2016320183(A1) |
申请公布日期 |
2016.11.03 |
申请号 |
US201615210699 |
申请日期 |
2016.07.14 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
Chiu Chui-Jeng;Lo Jen-Chieh;Cheng Ying-Chou;Liu Ru-Gun |
分类号 |
G01B15/04;H01J37/28 |
主分类号 |
G01B15/04 |
代理机构 |
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代理人 |
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主权项 |
1. A method comprising:
receiving, into a measurement tool, a substrate having a material feature, wherein the material feature is formed on the substrate according to a design feature; applying a source signal on the material feature by using a source in the measurement tool having a tool setting parameter; collecting a response signal from the material feature by using a detector in the measurement tool to obtain measurement data; with a computer connected to the measurement tool, calculating a simulated response signal from the design feature using the tool setting parameter; and with the computer, in response to determining that a difference between the collected response signal and the simulated response signal exceeds a predetermined value, causing the measurement tool to re-measure the material feature. |
地址 |
Hsin-Chu TW |