| 摘要 |
PROBLEM TO BE SOLVED: To provide a cylindrical type sputtering target, a cylindrical sintered body and a cylindrical compact, which have little distortion and high strength, and a manufacturing method of the former, or a cylindrical type sputtering target of high homogeneity, a cylindrical sintered body, a cylindrical compact, and their manufacturing methods.SOLUTION: A sputtering target according to one embodiment of the invention comprises a cylindrical sintered body having a relative density of 99.7% to 99.9%. Moreover, the cylindrical type sputtering target may include a plurality of cylindrical type sintered bodies adjacent through a constant space, and the difference in the relative density between the adjoining cylindrical type sintered bodes may be 0.1% or less.SELECTED DRAWING: Figure 1 |
