| 摘要 |
PURPOSE:To easily manufacture membrane masks of a small coefficient of thermal expansion by a method wherein an SiO2 film or a film containing at least an SiO2 film is adhered on a quartz frame. CONSTITUTION:The SiO2 film 12 of thickness approx. 2mum is formed on the surface of a polyimide film 11 of thickness approx. 5mum by a sputtering deposition method, then Au patterns 13 are formed on the surface of this SiO2 film by a normal deposition, plating and photolithography methods, thus changed into a membrane film substrate, and thereafter the membrane film substrate is adhered on the quartz frame 14 of thickness approx. 1mm. by means of liquid paste 15 of Si (OH)4. |
