Arrangement for coating substrates by vacuum deposition

摘要

An arrangement for coating substrates in an apparatus for vacuum deposition comprises a rotatable substrate holding structure in the form of a circular plate provided with holders for the substrates. The holders are arranged in circular rows around the axis of rotation of the plate so that the substrates held in the holder are arranged at axes such that those substrates in a single circular row have axes which intersect a single point along the axis of rotation of the plate. A vapor beam correction screen is mounted for rotation adjacent to the plate in an opposite direction about the same axis. A vapor beam correction screen is conformed in a stepwise manner to an even coating of spherical zones which have their center of curvature at the point of intersection of the substrate axes and are tangent to the poles of the respective substrates and cover the surface areas thereof.