| 摘要 |
PURPOSE:To prevent generation of a crack in a plastic film substrate in the stage of forming sputtering a soft magnetic film or a vertical magnetization film by setting the pressure of the argon to be introduced during sputtering and the RF (high frequency) power. CONSTITUTION:A thin nickel-iron alloy film and a thin cobalt-chromium film are respectively formed by sputtering on a polyester film ( I ) A polyester film to be used as a substrate 1 and a nickel-iron alloy to be used as a target 2 are set in a vacuum vessel 3. (II) Gaseous argon is introduced into the vessel 3 and the argon pressure is set at discharge limiting pressure - <1.5mTorr. (III) The output of a high frequency power source 4, i.e., RF power, is set at >=0.005kw per unit cm<2> of the target 2 and the sputtering is started while the substrate 1 is adequately rotated. (IV) The sputtering is stopped at the point of the time when the nickel-iron alloy formed by sputtering attains a desired thickness. (V) The target 2 is exchanged with a cobalt-chromium alloy and the operations II-IV are repeated. |
