Arc and track resistant articles utilizing photosensitive sag resistant cycloaliphatic epoxy resin coating compositions

摘要

A photosensitive sag resistant composition is made containing cycloaliphatic epoxy resin, a flexibilizing agent, arc and track resistant filler, thixotroping agent, and an amount of a photosensitive compound effective to initiate gelation with ultraviolet light exposure, where the composition is resistant to sag upon application to a surface, and has chemical and physical resistance to arced SF6 upon cure.