发明名称 MATCHING PROCESS FOR ELECTRON GUN STRUCTURE
摘要 PURPOSE:To determine the matching of both a structure and a cathode-ray tube with high accuracy and in a short time by utilizing a diffraction pattern of a laminous beam generated when the luminous beam is made to pass through the electron gun structure, for fixing the relative position of the structure to the cathoderay tube. CONSTITUTION:A luminous beam device 16 is arranged in front of one aperture 12a out of two apertures 12a and 12b of an electron gun structure 7, while arranging a light receiver 21 receiving a diffraction pattern of the luminous beam 18, behind the other aperture 12b. The diffraction pattern of an ellipse 22 is generated when the luminous beam 18 is made to pass through both apertures 12a and 12b. While utilizing said diffraction pattern, the direction of distortion of the electron gun structure 7 can be judged according to the direction of inclination of the ellipse 22 received by the light receiver 21, thus remarkably shortening the time for matching the structure. Further, the slight distortion of the structure 7 can be easily recognized thus performing highly accurate matching.
申请公布号 JPS6056330(A) 申请公布日期 1985.04.01
申请号 JP19830164492 申请日期 1983.09.07
申请人 NIPPON DENKI KK 发明人 KIDA KAZUAKI
分类号 H01J29/50;H01J9/34;H01J9/44 主分类号 H01J29/50
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