| 摘要 |
PURPOSE:To remove the absorption of a visible section introduced in a lens forming process by removing an optical absorption layer in the process of the formation of a microlens in the manufacture of a solid-state image pickup element forming the microlens on the solid-state image pickup element. CONSTITUTION:A lens fixing layer 6 is formed on a solid-state image pickup element substrate, and microlens forming layers 7 are shaped on the layer 6. A PGMA liquid containing a light absorber is applied and heated to form a light absorbing layer 8. Photo resist layers 9 are shaped, and deformed into arcuate patterns 9' through a post-baking. The whole is inserted into a plasma etching device, drawn to a vacuum, and CF4 gas and O2 gas are introduced and the surface is etched by plasma. Accordingly, the lens-shaped patterns 9' and the light absorber layer 8 are removed. |
