| 发明名称 |
Pattern forming method |
| 摘要 |
A pattern of a monomolecular film or a monomolecular built-up film is formed on a base through the steps of providing a lift-off layer on a base on which a monomolecular film or a monomolecular built-up film is to be deposited, depositing the monomolecular film or the monomolecular built-up film on the base and the lift-off layer, and removing the lift-off layer from the base.
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| 申请公布号 |
US4586980(A) |
申请公布日期 |
1986.05.06 |
| 申请号 |
US19850702217 |
申请日期 |
1985.02.15 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
HIRAI, YUTAKA;TOMIDA, YOSHINORI;MATSUDA, HIROSHI;NISHIMURA, YUKUO |
| 分类号 |
H01L21/306;B05D1/20;B44C1/22;C23F1/02;G03F7/26;H01L21/027;H01L21/205;H01L27/142;H01L51/30;H01L51/42;(IPC1-7):C23F1/00;C03C15/00 |
主分类号 |
H01L21/306 |
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