| 摘要 |
PURPOSE:To stabilize the resist sensitivity by approaching a substrate, and a temperature control plate in a parallel state to cool during cooling after baking before developing. CONSTITUTION:A beam 1 is driven in the state that a double shutter 3 is opened to dispose a substrate 12 above a hot plate 6, and the substrate 12 is baked by the plate 6 and a heater 5. The substrate 12 on the beam 1 is set on four insulating pins 9, and a double shutter 3 is simultaneously closed. The four pins 9 are moved down, the substrate 12 on the pins 9 are contacted with a temperature control plate 8 to cool. Then, a walking beam 1 is driven to place the substrate 12 on the plate 8 on the beam 1, and conveyed to an exposure unit. |
