发明名称 CHARGED PARTICLE BEAM APPLYING DEVICE
摘要 PURPOSE:To sufficiently reduce an apparent deflection distortion by providing three or more auxiliary lenses for reregulating the focus of charged particle beam at every deflecting point. CONSTITUTION:Charged particle beam emitted from an article point is focused through a main lens 5 on the center 2 of a sample surface 3. Charged particles deflected by a deflector 4 become an orbit 11, and further pass the out of the axis of a main lens to be deflected to become an orbit 12. Auxiliary lenses 61, 62, 63 are provided, focused, and corrected for the distortions of x- and y-directions. The orbits become 15, 16, 17 and can be freely controlled including the rotation around the optical axis.
申请公布号 JPS61147525(A) 申请公布日期 1986.07.05
申请号 JP19850278916 申请日期 1985.12.13
申请人 HITACHI LTD 发明人 KURODA KATSUHIRO
分类号 H04N5/32;G21K1/093;G21K5/04;H01J37/147;H01J37/21;H01L21/027;H01L21/30;H05H7/00 主分类号 H04N5/32
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