发明名称 |
INSPECTION APPARATUS, INSPECTION METHOD, LITHOGRAPHIC APPARATUS, PATTERNING DEVICE AND MANUFACTURING METHOD |
摘要 |
Disclosed is a method of monitoring a focus parameter during a lithographic process. The method comprises acquiring first and second measurements of, respectively first and second targets, wherein the first and second targets have been exposed with a relative best focus offset. The method then comprises determining the focus parameter from first and second measurements. Also disclosed are corresponding measurement and lithographic apparatuses, a computer program and a method of manufacturing devices. |
申请公布号 |
NL2016864(A) |
申请公布日期 |
2016.12.12 |
申请号 |
NL20162016864 |
申请日期 |
2016.05.31 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
ANTON BERNHARD VAN OOSTEN;PAUL CHRISTIAAN HINNEN;ROBERTUS CORNELIS MARTINUS DE KRUIF;ROBERT JOHN SOCHA |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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