Maskless growth of patterned films

摘要

PCT No. PCT/US82/00745 Sec. 371 Date Jul. 19, 1982 Sec. 102(e) Date Jul. 19, 1982 PCT Filed Jun. 1, 1982 PCT Pub. No. WO83/04269 PCT Pub. Date Dec. 8, 1983.A method of growing patterned films on a substrate in a deposition chamber without masking, the method consisting of the following steps: pressurizing the chamber with a fluid medium to form a thin absorption layer on the substrate; evacuating the chamber to remove excess fluid medium; prenucleating portions of the substrate with a focused energy beam; repressurizing the chamber with a fluid medium; and inducing deposition of material from the fluid medium and thereby growing a patterned film with deposition occurring primarily on the prenucleated portions of the substrate.