发明名称 |
PHOTOCURABLE RESIN COMPOSITION |
摘要 |
<p>Disclosed is a photocurable composition comprising (a) a radical-polymerizable monomer, (b) an .alpha.-ketocar-bonyl compound and (c) a derivative of mercaptobenzimidazole, mercaptobenzothiazole or mercaptobenzoxazole or an aromatic amine nucleus-substituted with an electron-attractive group. This composition has a high photocuring speed at a temperature close to normal temperature and gives a cured product excellent in various physical properties. This composition is valuable as a dental adhesive or resin.</p> |
申请公布号 |
CA1221496(A) |
申请公布日期 |
1987.05.05 |
申请号 |
CA19840464137 |
申请日期 |
1984.09.27 |
申请人 |
MITSUI PETROCHEMICAL INDUSTRIES, LTD. |
发明人 |
SAKASHITA, TAKESHI;NAKANO, TAKAYUKI |
分类号 |
C08F2/50;G03F7/031;(IPC1-7):C08F2/50 |
主分类号 |
C08F2/50 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|