发明名称 PHOTOCURABLE RESIN COMPOSITION
摘要 <p>Disclosed is a photocurable composition comprising (a) a radical-polymerizable monomer, (b) an .alpha.-ketocar-bonyl compound and (c) a derivative of mercaptobenzimidazole, mercaptobenzothiazole or mercaptobenzoxazole or an aromatic amine nucleus-substituted with an electron-attractive group. This composition has a high photocuring speed at a temperature close to normal temperature and gives a cured product excellent in various physical properties. This composition is valuable as a dental adhesive or resin.</p>
申请公布号 CA1221496(A) 申请公布日期 1987.05.05
申请号 CA19840464137 申请日期 1984.09.27
申请人 MITSUI PETROCHEMICAL INDUSTRIES, LTD. 发明人 SAKASHITA, TAKESHI;NAKANO, TAKAYUKI
分类号 C08F2/50;G03F7/031;(IPC1-7):C08F2/50 主分类号 C08F2/50
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