A MANIFOLD ASSEMBLY

摘要

A gas handling manifold (1) for use in metal-organic chemical vapour deposition systems, the manifold having a radial configuration with each vent/run valve (3, 4, 5 and 6) equidistant from the centre. Ensuring that gases switched simultaneously arrive in a reactor vessel (9) substantially simultaneously, alleviating problems caused by intermediate reactions in the manifold (1). The manifold (1) has minimal unflushed areas (dead volumes) allowing incompatible materials to be handled in tandem.