| 发明名称 |
METHODS OF INSPECTING PATTERN MASKS |
| 摘要 |
An electron beam fabricated mask used in the production of integrated circuits is tested by a method that includes the steps of forming a print of the mask and then inspecting the print by writing the same electron beam pattern or complement thereof on the print and detecting pattern coincidence and non-coincidence with a vector scan system. |
| 申请公布号 |
DE3370697(D1) |
申请公布日期 |
1987.05.07 |
| 申请号 |
DE19833370697 |
申请日期 |
1983.04.05 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
VETTIGER, PETER;WILSON, ALAN DICKSON |
| 分类号 |
G01N21/88;G01B15/00;G01N21/956;H01J37/304;H01L21/027;H01L21/66;(IPC1-7):G03B41/00 |
主分类号 |
G01N21/88 |
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