The invention relates to a vacuum chamber, especially to an Si-MBE system, for coating a substrate. A coating process is continuously monitored by means of an He backscattering measuring system.
申请公布号
DE3545240(A1)
申请公布日期
1987.06.25
申请号
DE19853545240
申请日期
1985.12.20
申请人
LICENTIA PATENT-VERWALTUNGS-GMBH;GEMETEC GESELLSCHAFT FUER MESSTECHNIK UND TECHNOLOGIE MBH
