| 摘要 |
PURPOSE:To make it possible to take the focus exactly even if a thick film layer exists which is thicker than the depth of focus of an optical system for alignment detection, by performing the relative focus adjustment between a projection optical system and the optical system for alignment detection. CONSTITUTION:The adjustment is performed in the manner in which the waist 20 of a laser beam 18 for alignment and the imaging plane of a projection pattern of reticule 44 are made to almost coincide with each other and are spaced by a specified distance. That is, the imaging plane 58 of an imaging light flux 57 of the projection pattern and the waist 20 of the laser beam 18 are spaced by the distance mentioned below in the direction of optical axis. This distance is equal to h/n where (h) is the thickness of a polyimide thick film 14 and (n) is the refraction index to the laser beam 18. Even if the intermediate layer 34C of a thick film exists between a surface resist layer 34D and a base substrate 34A, the alignment operation can be excellently and exactly performed utilizing an alignment mark 34B formed on the base substrate 34A. |
