发明名称 HIGH-FREQUENCY POWER TRANSISTOR WITH BIPOLAR EPITAXIAL TECHNOLOGY
摘要 <p>In a high-frequency power transistor with bipolar epitaxial technology, the emitter (2), the base (3) and the collector (4) contacts are located on a main plane of a silicon chip. On the second, opposite main plane, a metallization (22) can be applied to provide a trouble-free connection with a cooling body. Within the substrate, shield electrodes (13, 15) can be provided to compensate to a large extent the undesirable effect of depletion layer diodes.</p>
申请公布号 WO1988002554(A1) 申请公布日期 1988.04.07
申请号 DE1987000397 申请日期 1987.09.02
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