| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing pad excellent in dressing properties and suppression of occurrence of a polishing scratch, and to provide a method for manufacturing the same.SOLUTION: There is provided a polishing pad having a polyurethane resin sheet, in which, when having measured the polyurethane resin sheet at measurement frequency of 10 radian/second and a tension mode, a ratio (tanδ(25°C)) of loss elastic modulus E" (25°C) to storage elastic modulus E'(25°C) at 25°C of the polyurethane resin sheet is 0.25 or less, and storage elastic modulus E' at 45 to 65°C of the polyurethane resin sheet is 200 MPa or less.SELECTED DRAWING: None |
