发明名称 Single crystal growing method and apparatus
摘要 In a single crystal growing technique (crystal pulling) a method and apparatus for minimizing impurity contamination and preventing heat convection currents from affecting the solid-melt crystal growing interface which uses a floating baffle plate in the interior of the feed melt containing crucible in order to obtain a single crystal of a compound semiconductor having a high melting point and exhibiting a high dissociation pressure at the said melting point such as a compound semiconductor of Groups III-V, especially GaAs or Gap, the crystal having a small dislocation density. Improvement is made on the shape of the baffle plate and on baffle plate control means, and this baffle plate is combined with selected intra-furnace pressure or heating means or temperature measuring means.
申请公布号 US4832922(A) 申请公布日期 1989.05.23
申请号 US19870102373 申请日期 1987.09.29
申请人 GAKEI ELECTRIC WORKS CO., LTD. 发明人 NISHIZAWA, MINORU
分类号 C30B15/30 主分类号 C30B15/30
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