发明名称 Ion Beam implant system
摘要 PCT No. PCT/US85/00929 Sec. 371 Date Mar. 17, 1987 Sec. 102(e) Date Mar. 17, 1987 PCT Filed May 17, 1985 PCT Pub. No. WO86/06874 PCT Pub. Date Nov. 20, 1986.A charge forming system and apparatus for introducing ion source materials into the ion source vaporizer of an ion implant instrument is disclosed.
申请公布号 US4855604(A) 申请公布日期 1989.08.08
申请号 US19870947914 申请日期 1987.03.17
申请人 AIR PRODUCTS AND CHEMICALS, INC. 发明人 RIAHI, SHANTIA
分类号 H01J27/02;H01J37/08;H01J37/317;H01J49/04 主分类号 H01J27/02
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