| 发明名称 |
Method of production galvanically deposited aluminum layers for use as contacts of microcircuits |
| 摘要 |
Contacts of microcircuits are produced by galvanically depositing aluminum layers on a substrate carrying a microcircuit. |
| 申请公布号 |
US4869926(A) |
申请公布日期 |
1989.09.26 |
| 申请号 |
US19870027491 |
申请日期 |
1987.03.17 |
| 申请人 |
SCHERING AKTIENGESELLSCHAFT |
发明人 |
BOCK, MARTIN;TENBRINK, DETLEF |
| 分类号 |
H01L23/52;H01L21/3205;H01L21/60;H01L21/768;H05K1/09;H05K3/18;H05K3/24 |
主分类号 |
H01L23/52 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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