发明名称 Process of producing silver halide grains.
摘要 <p>A process of producing silver halide grains by supplying an aqueous solution of a water-soluble silver salt, an aqueous solution of a water-soluble halide, and an aqueous solution of a protective colloid to a mixer disposed outside of a reaction vessel containing an aqueous solution of a protective colloid. The protective colloid contains nuclei of silver halide grains for causing the crystal growth of silver halide grains. The process further includes mixing the aqueous solutions to form fine, silver halide grains, and immediately supplying the fine grains to the reaction vessel to perform the crystal growth of silver halide grains in the reaction vessel. The temperature of the aqueous solution of the protective colloid in the mixer is kept below 40 DEG C. Further, a process of producing a photographic emulsion by supplying an aqueous solution of a water-soluble silver salt and an aqueous solution of a water-soluble halide to a mixer disposed outside of a reaction vessel for causing the nucleus formation and/or the crystal growth of silver halide grains while controlling the flow rates thereof. The process further includes the steps of: mixing the solutions while controlling the rotational speed of a propeller of the mixer to form fine, silver halide grains; immediately supplying the fine grains into the reaction vessel to perform the nucleus formation and/or the crystal growth of silver halide grains in the reaction vessel. The aqueous solution of the water-soluble silver salt and the aqueous solution of the water-soluble halide are previously diluted with a solution of a protective colloid and then supplied to the mixer.</p>
申请公布号 EP0374853(A1) 申请公布日期 1990.06.27
申请号 EP19890123488 申请日期 1989.12.19
申请人 FUJI PHOTO FILM CO., LTD. 发明人 ICHIKAWA, YASUNORI C/O FUJI PHOTO FILM CO., LTD.;OHNISHI, HIROSHI C/O FUJI PHOTO FILM CO., LTD.;URABE, SHIGEHARU C/O FUJI PHOTO FILM CO., LTD.;KATOH, AKIRA C/O FUJI PHOTO FILM CO., LTD.
分类号 C01G5/02;G03C1/015 主分类号 C01G5/02
代理机构 代理人
主权项
地址
您可能感兴趣的专利