发明名称 |
Plasma processing method. |
摘要 |
<p>A method of plasma-processing which comprises the step of plasma-processing a matter (42) mounted on a component (30) in a plasma processing vessel (50) by using plasma gases, and the step of introducing an inactive gas into the plasma processing vessel (50) when no plasma process is conducted in the vessel (50) and gases resulted from the previous plasma process remain therein.</p> |
申请公布号 |
EP0393637(A1) |
申请公布日期 |
1990.10.24 |
申请号 |
EP19900107369 |
申请日期 |
1990.04.18 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
KOJIMA, HIROSHI, 305 GREEN-HEIM-MIDORIYAMA, 1-22-1;TAHARA, YOSHIFUMI, A202 HACHIBANCHI-CORPO 1-8-8;ARAI, IZUMI |
分类号 |
C23F4/00;H01J37/32;H01L21/3065;H01L21/311 |
主分类号 |
C23F4/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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