| 摘要 |
<p>The present invention relates to a machine for the continuous exposure of laminar photosensitive materials placed in contact with original films. The machine comprises a planar slit for guiding the photosensitive materials, the slit being defined by a rigid planar plate of light-transparent material which is superimposed on a flexible supporting and sliding surface and acts thereon with a predetermined force to ensure the contact of the photosensitive materials. Light emitting means are further located beyond the plate on the side opposite to the supporting surface, and at least one pair of motorized conveyor rollers is arranged upstream of the inlet of the guiding slit for the continuous advancement of the photosensitive materials. The face of the plate which is directed toward the guiding slit has a uniform distribution of optically transparent surface discontinuities which are adapted to prevent formation of vacuum and to avoid the adhesion of the contact surfaces of the films with the face of the plate. The supporting surface further consists of an at least partially inelastic pad which automatically adapts to the shapes and thickness of the photosensitive materials. The conveyor rollers consist of rigid cores with soft elastic coverings and are mounted on fixed supports which are optionally adjustable at a center distance strictly smaller than the outer diameter thereof.</p> |
