CLEANING OF SEMICONDUCTOR WAFER,申请号JP19890232201-传众专利搜索

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发明名称	CLEANING OF SEMICONDUCTOR WAFER
摘要
申请公布号	JPH0394428(A)	申请公布日期	1991.04.19
申请号	JP19890232201	申请日期	1989.09.06
申请人	MITSUBISHI ELECTRIC CORP	发明人	WASHITANI AKIHIRO;OMORI MASASHI
分类号	H01L21/304	主分类号	H01L21/304
代理机构		代理人
主权项
地址

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