发明名称 FILM BASED ON SILICON DIOXIDE AND PRODUCTION THEREOF.
摘要 <p>A film based on silicon dioxide and contg. zirconium etc. Prepd. by reactive DC sputtering. Various multilayered films contg. the film, such as those used for antirefletion coating, alkali barrier film, or achromatic glass can be produced by physical vapour deposition without breaking a vacuum. @(51pp Dwg.No.0/7).</p>
申请公布号 EP0436741(A1) 申请公布日期 1991.07.17
申请号 EP19900911700 申请日期 1990.08.01
申请人 ASAHI GLASS COMPANY LTD. 发明人 ANDO, EIICHI 2617-120, IMAJUKU-CHO ASAHI-KU;MITSUI, AKIRA 1-1, KASHIWA-CHO ASAHI-KU;EBISAWA, JUNICHI;SUZUKI, KOICHI 4-6-502, WAKABADAI ASAHI-KU;MATSUMOTO, KIYOSHI;OYAMA, TAKUJI 350-38, HAZAWA-CHO KANAGAWA-KU
分类号 B32B17/10;C03C17/245;C03C17/34;C03C27/12;C23C14/08;C23C14/10;C23C14/34;G02F1/1333;G02F1/1335 主分类号 B32B17/10
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