Plasma apparatus, and method and system for extracting electrical signal of member to which high-frequency-wave is applied.

摘要

A system for measuring a temperature of a high-frequency electrode (20) of a plasma etching apparatus has a temperature detecting element (62) for detecting a temperature, a metal sheath member (63) in which the temperature detecting element (62) is provided to be insulated from it and which is kept in a DC floating state, an insulating member (25) for insulating the sheath member (63) from the high-frequency electrode (20), and a filter (65) for removing a high-frequency component of an electrical signal sent from the temperature detecting element (62). <IMAGE> <IMAGE>