发明名称 |
PHOTOPOLYMERIZABLE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE |
摘要 |
A photopolymerizable composition comprising (I) a polymerizable compound having an ethylenically unsaturated double bond, (II) a film-forming having alkali-solubility or alkali-swell characteristic and (III) a photopolymerization initiator is disclosed. The photopolymerizable composition further comprising (IV) a silane coupling agent having at least one group selected from the group consisting of vinyl group, acryloyl group and methacryloyl group at a terminal end of the molecule. There is also disclosed a photosensitive lithographic printing plate comprising the photopolymerizable composition as a photosensitive layer and an aluminum plate as a substrate.
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申请公布号 |
CA2053984(A1) |
申请公布日期 |
1992.04.25 |
申请号 |
CA19912053984 |
申请日期 |
1991.10.22 |
申请人 |
NIPPON PAINT CO., LTD. |
发明人 |
HASE, TAKAKAZU;ARIMATSU, SEIJI |
分类号 |
G03F7/027;G03F7/00;G03F7/031;G03F7/032;G03F7/075;(IPC1-7):G03F7/028;G03F7/038;G03F7/09 |
主分类号 |
G03F7/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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