发明名称 PHOTOPOLYMERIZABLE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE
摘要 A photopolymerizable composition comprising (I) a polymerizable compound having an ethylenically unsaturated double bond, (II) a film-forming having alkali-solubility or alkali-swell characteristic and (III) a photopolymerization initiator is disclosed. The photopolymerizable composition further comprising (IV) a silane coupling agent having at least one group selected from the group consisting of vinyl group, acryloyl group and methacryloyl group at a terminal end of the molecule. There is also disclosed a photosensitive lithographic printing plate comprising the photopolymerizable composition as a photosensitive layer and an aluminum plate as a substrate.
申请公布号 CA2053984(A1) 申请公布日期 1992.04.25
申请号 CA19912053984 申请日期 1991.10.22
申请人 NIPPON PAINT CO., LTD. 发明人 HASE, TAKAKAZU;ARIMATSU, SEIJI
分类号 G03F7/027;G03F7/00;G03F7/031;G03F7/032;G03F7/075;(IPC1-7):G03F7/028;G03F7/038;G03F7/09 主分类号 G03F7/027
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