| 摘要 |
PROBLEM TO BE SOLVED: To provide a deposition roller excellent in conveyance stability, capable of suppressing a damage to a substrate during deposition, and used for a film deposition apparatus by a plasma CVD method; and to provide the film deposition apparatus by the plasma CVD method.SOLUTION: In deposition rollers 39, 40, each outer peripheral surface of the deposition rollers 39, 40 is covered with coating layers 37A and 37B respectively, and the arithmetic average roughness (Ra) of each surface of the coating layers 37A and 37B is in the range of 0.2-1.0 μm. A film deposition apparatus 31 by a plasma CVD method includes plasma generation means for supplying power to the two deposition rollers 39, 40 respectively, and capable of utilizing them as each counter electrode.SELECTED DRAWING: Figure 1 |
