发明名称 A photosensitive polyimide composition.
摘要 <p>The present invention provides photosensitive compositions which comprise polyimide precursors having a chemical structure selected from several specific chemical structures and/or specific amide bond density and are adjusted so that the film obtained by applying and drying the composition may exhibit a specific absorbance to light. The polyimide film obtained by heat-curing the above photosensitive composition exhibits excellent physical properties and water resistance, and has high adhesive strength to epoxy resins, inorganic materials and metals.</p>
申请公布号 EP0580108(A2) 申请公布日期 1994.01.26
申请号 EP19930111557 申请日期 1993.07.19
申请人 ASAHI KASEI KOGYO KABUSHIKI KAISHA 发明人 MATSUOKA, YOSHIO;YOKOTA, KANICHI;KATAOKA, YASUHIRO
分类号 G03F7/038;H05K1/00;H05K1/03;(IPC1-7):G03F7/038;G03F7/037 主分类号 G03F7/038
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