发明名称 |
Photosensitive material processor |
摘要 |
A processor for processing photosensitive material having a first processing tank containing a first processing fluid containing at least one component of a first concentration and a second processing tank containing processing fluid having the same component to that of the first processing fluid, however, the concentration of the component being different than the first concentration. A weir is provided for causing fluid to flow from the first tank to the second tank resulting from the hydrostatic pressure of the first fluid in the first tank. The weir has a configuration such that concentration difference between processing fluid in said tanks does not change significantly over a predetermined period of time.
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申请公布号 |
US5341189(A) |
申请公布日期 |
1994.08.23 |
申请号 |
US19930053780 |
申请日期 |
1993.04.27 |
申请人 |
EASTMAN KODAK COMPANY |
发明人 |
HELFER, JEFFREY L.;DEVANEY, JR., MARK J. |
分类号 |
G03D3/02;G03D3/06;G03D3/08;(IPC1-7):G03D3/02 |
主分类号 |
G03D3/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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