| 主权项 |
1. A substrate liquid processing apparatus comprising:
a substrate holding unit configured to hold a substrate; a processing liquid nozzle configured to supply a processing liquid to the substrate held by the substrate holding unit; a nozzle arm configured to hold the processing liquid nozzle; and an arm cleaning tank configured to immerse an entire surface of the nozzle arm in a cleaning liquid so as to clean the nozzle arm; a chamber configured to accommodate the substrate holding unit, the processing liquid nozzle, the nozzle arm, and the arm cleaning tank; a driving mechanism configured to drive the nozzle arm and arranged at a lateral side of the arm cleaning tank, wherein the arm cleaning tank is provided in a bottom surface of the chamber to form a concave portion storing the cleaning liquid from an opening thereof toward a downward side, and the nozzle arm includes a vertical bar portion that extends downwardly at a lateral side of a position where the nozzle arm is supported by the driving mechanism, and a horizontal bar portion that extends horizontally from a lower end of the vertical bar portion, and when the driving mechanism moves the nozzle arm down to a cleaning position, an entirety of the horizontal bar portion and the processing liquid nozzle are immersed in the cleaning liquid at the same time. |
