发明名称 |
Magnetron plasma apparatus |
摘要 |
A magnetron plasma apparatus boosted by hollow cathode plasma includes at least one electrically connected pair of a first hollow cathode plate and a second hollow cathode plate placed opposite to each other at a separation distance of at least 0.1 mm and having an opening following an outer edge of a sputter erosion zone on a magnetron target so that a magnetron magnetic field forms a perpendicular magnetic component inside a hollow cathode slit between plates and, wherein the plates and are connected to a first electric power generator together with the magnetron target to generate a magnetically enhanced hollow cathode plasma in at least one of a first working gas distributed in the hollow cathode slit and a second working gas admitted outside the slit in contact with a magnetron plasma generated in at least one of the first working gas and the second working gas. |
申请公布号 |
US9508532(B2) |
申请公布日期 |
2016.11.29 |
申请号 |
US201414206197 |
申请日期 |
2014.03.12 |
申请人 |
BB PLASMA DESIGN AB |
发明人 |
Bardos Ladislav;Barankova Hana |
分类号 |
C23C14/00;H01J37/34;H01J37/32;C23C14/35 |
主分类号 |
C23C14/00 |
代理机构 |
Young & Thompson |
代理人 |
Young & Thompson |
主权项 |
1. A magnetron plasma apparatus boosted by hollow cathode plasma for plasma processing on a substrate in a reactor, comprising (a) a parallel plate hollow cathode with a slit wherein a hollow cathode effect can be excited, and (b) a magnetron sputtering apparatus with a magnetron target, a first electric power generator for generation of plasma and a magnetic system generating a magnetron magnetic field giving form to an erosion zone on a surface of said magnetron target and spatial shape of a magnetron plasma, wherein:
at least one electrically connected pair of a first hollow cathode plate and a second hollow cathode plate placed opposite to each other at a separation distance of at least 0.1 mm has an opening following an outer edge of a sputter erosion zone on said magnetron target so that said magnetron magnetic field forms a perpendicular magnetic induction component inside a hollow cathode slit between said plates; and said pair of plates is connected to said first electric power generator together with said target to generate a magnetically enhanced hollow cathode plasma in at least one of a first working gas distributed in said hollow cathode slit and a second working gas admitted outside said slit, said magnetically enhanced hollow cathode plasma in contact with a magnetron plasma generated in at least one of said first working gas and said second working gas. |
地址 |
Uppsala SE |