RESIST PATTERN FORMING METHOD, RESIST LATENT IMAGE FORMING METHOD, RESIST PATTERN FORMING DEVICE, AND RESIST MATERIAL

摘要

PROBLEM TO BE SOLVED: To provide a resist pattern forming method which can solve a trade-off relationship and improve sensitivity of the resist.SOLUTION: The resist pattern forming method of the present invention comprises: a resist layer forming step S101 of forming a resist layer 12 on a substrate 11; an activation step S103 of activating the resist layer by irradiation of an active energy beam; an attenuation suppressing step S105 of suppressing attenuation of activity of the resist layer; a pattern latent image forming step S107 of forming a pattern latent image on the activated resist layer by irradiation of a latent image forming energy beam; and an image development step S110 of developing the resist layer.SELECTED DRAWING: Figure 1