EXPOSURE DEVICE AND POSITIONING METHOD

摘要

PURPOSE:To accurately detect the position of an alignment mark by detecting the step difference of the alignment mark formed on a photosensitive base board by using a probe in which a distance from the photosensitive surface is kept constant. CONSTITUTION:In a device for exposing the pattern of a mask to a photosensitive substrate (W) placed on a stage, the device is provided with a mark detecting means 18 having a probe 24 provided at a nearly constant distance from the center of an exposure field of view to move vertical to the surface of a photosensitive substrate so as to keep a distance from the surface constant, a stage position detecting means 12 for detecting the moving coordinate of a stage 9 and a computing means for outputting a mark position from the detection signal of the mark detecting means and the moving coordinates of the stage position detecting means.