Reinigungsvorrichtung für Plättchen-Halterungsplatte

摘要

A cleaning device for a wafer mount plate (6) formed into a disk-like shape having a surface for mounting wafers thereon by an adhesive. The wafer mount plate is rotatably mounted on a receiving roller (7) and is rotated round its own axis horizontally by bringing a driving roller (29) into contact with the peripheral side surface of the mount plate. An upper surface washing brush (31), a lower surface washing brush (31) and a side surface washing brush (33) are provided against the wafer mount plate, which are facing to the upper surface, lower surface and peripheral side surface of the wafer mount plate, respectively. Whole surface of the wafer mount plate is washed at the same time by bringing respective brushes into slidable contact with the wafer mount plate. After washing, the wafer mount plate is dried by blowing a gas (78,79) thereto.