| 摘要 |
PURPOSE: To provide an aligner which can expose without increasing illuminance by shortening an exposure time. CONSTITUTION: A semiconductor wafer W having a flat orientation flat part Wa at a periphery and light irradiating means 40 are relatively moved to so form the periphery of the wafer W as to expose in a predetermined width. The mask 45 of the means 40 has an inner side 46 in contact with the peripheral edge Wb of the central side of the wafer W and an oblique side 47 expanded at a predetermined angleθoutward from the end of the side 46. Thus, the UV light of sufficient and uniform exposure can be emitted to the circular part of the wafer W and the periphery of the part Wa, the resist residue due to exposure failure is prevented, and 'sagging width' due to the exposure failure at the part Wa is eliminated to sharply remove unnecessary resist.
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