发明名称 |
EXPOSURE APPARATUS AND EXPOSURE METHOD |
摘要 |
To use a charged particle beam to form a complex and fine pattern by decreasing movement error of a stage, provided is an exposure apparatus comprising a beam generating section that generates a charged particle beam; a stage section that has a sample mounted thereon and moves the sample relative to the beam generating section; a detecting section that detects a position of the stage section; a predicting section that generates a predicted drive amount obtained by predicting a drive amount of the stage section based on a detected position of the stage section; and an irradiation control section that performs irradiation control for irradiating the sample with the charged particle beam, based on the predicted drive amount. Also provided is an exposure method. |
申请公布号 |
US2016314934(A1) |
申请公布日期 |
2016.10.27 |
申请号 |
US201615052881 |
申请日期 |
2016.02.25 |
申请人 |
ADVANTEST CORPORATION |
发明人 |
YAMADA Akio;SEYAMA Masahiro;NASUNO Hideki |
分类号 |
H01J37/304;H01J37/244;H01J37/20;H01J37/317 |
主分类号 |
H01J37/304 |
代理机构 |
|
代理人 |
|
主权项 |
1. An exposure apparatus comprising:
a beam generating section that generates a charged particle beam; a stage section that has a sample mounted thereon and moves the sample relative to the beam generating section; a detecting section that detects a position of the stage section; a predicting section that generates a predicted drive amount obtained by predicting a drive amount of the stage section based on a detected position of the stage section; and an irradiation control section that performs irradiation control for irradiating the sample with the charged particle beam, based on the predicted drive amount. |
地址 |
Tokyo JP |