| 摘要 |
PURPOSE: To provide an aligner which prevents the decrease in intensity of vacuum ultraviolet rays or soft X-rays emitted from a plasma X-ray source, protects optical elements against damage, enhances exposure intensity and decreases running cost. CONSTITUTION: A shutter mechanism 11 which opens or closes periodically is provided between a plasma light emitting spot and an optical element 12, the shutter is opened when vacuum ultraviolet rays or soft X-rays 9 are generated at the plasma light emitting spot, and the shutter is closed when transpirations or shock waves are dispersed from the plasma light emitting spot. Therefore, the optical element 12 is protected against damage without decreasing the intensity of vacuum ultraviolet rays or soft X-rays emitted from a X-ray source, so that an exposure system of this constitution can be enhanced in exposure intensity, and an optical element is enhanced in service life and operation rate, and concurrently the exposure system is lessened in running cost. |
