发明名称 COMPOUND SEMICONDUCTOR DEVICE AND ITS MANUFACTURE
摘要 PURPOSE: To reduce exhaustion of carrier in a hetero junction interface by providing a planar doping layer of one conductivity type decision impurities of a small diffusion coefficient to an interface between one conductivity type AlInGaP layer and one conductivity type III-V compound semiconductor layer containing As provided thereon. CONSTITUTION: A planar doping layer 5 of one conductivity type conductivity type decision impurities of a small diffusion coefficient is provided to an interface between one conductivity type Alx Iny Ga1-x-y P layer 4 and one conductivity type III-V compound semiconductor layer 6 provided thereon. The one conductivity type Alx Iny Ga1-x-y P layer 4 is n-type InGaP of x=0 and one conductivity type conductivity type decision impurities of a small diffusion coefficient are Si. The one conductivity type III-V compound semiconductor layer 6 containing As is any of one conductivity type GaAs layer, one conductivity type AlGaAs layer and one conductivity type GaAs/AlGaAs hetero junction composite layer.
申请公布号 JPH08293505(A) 申请公布日期 1996.11.05
申请号 JP19950099189 申请日期 1995.04.25
申请人 FUJITSU LTD 发明人 IMANISHI KENJI
分类号 H01L29/73;H01L21/205;H01L21/331;H01L21/338;H01L29/205;H01L29/737;H01L29/778;H01L29/812;(IPC1-7):H01L21/331 主分类号 H01L29/73
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