发明名称 |
ENHANCED CONTROL OF SHUTTLE MASS MOTION IN MEMS DEVICES |
摘要 |
A MEMS device and a method of forming the same. A disclosed method includes: providing a silicon substrate layer, a buried oxide layer and a device silicon layer; using a microfabrication process to pattern a set of device features on the device silicon layer including a shuttle mass and an anchor frame; removing the silicon substrate layer and buried oxide below the shuttle mass; placing a shadow mask on a surface of the device silicon layer, wherein the shadow mask has an microscale opening to expose at least one device feature; and forming a nanoscale stopper on a sidewall of the at least one device feature by depositing a deposition material through the opening in a controlled manner. |
申请公布号 |
WO2016164529(A3) |
申请公布日期 |
2016.11.24 |
申请号 |
WO2016US26353 |
申请日期 |
2016.04.07 |
申请人 |
RENSSELAER POLYTECHNIC INSTITUTE |
发明人 |
BORCA-TASCIUC, Diana-Andra;HELLA, Mona, Mostafa;OXAAL, John |
分类号 |
H01L21/02;H01L29/84 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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