Lithographic apparatus and device manufacturing method

摘要

A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

主权项

1. A lithographic projection apparatus configured to project a patterned beam onto a substrate using a projection system and configured to supply liquid to a space between the projection system and the substrate using a liquid supply system, the apparatus comprising:
a substrate table configured to hold a substrate, the substrate table comprising a recess configured to receive the substrate, wherein the recess is larger than the substrate such that a trench is provided around an edge of the substrate when the substrate is held by the substrate table, the trench configured to collect at least part of the liquid; a liquid confinement member configured to at least partly confine the liquid in the space between the projection system and a surface of the substrate, the substrate table or both; and a removal opening comprising a porous member facing the substrate and vertically spaced apart from a bottom surface of the substrate, when the substrate is located under the projection system and the removal opening configured to remove at least part of the liquid through the porous member.