发明名称 |
ALSB/INP SINGLE HETERO-JUNCTION TRANSISTOR ON INP SUBSTRATE FOR HIGH SPEED AND POWER |
摘要 |
PROBLEM TO BE SOLVED: To provide the epitaxial structure of a single hetero-junction bipolar transistor using InP for a base and a collector and having high power capacity at high speed. SOLUTION: This transistor has a collector 18 composed of InP on a semiconductor supporter 20, a base 16 constituted of InP on the collector 18, and an emitter 12 on the base 16, and the emitter 12 is configured of approximately 39mol% AlP and approximately 61mol% AlSb. A gradient concentration distribution layer 14 is formed between the base 16 and the emitter 12.
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申请公布号 |
JPH09106992(A) |
申请公布日期 |
1997.04.22 |
申请号 |
JP19960143333 |
申请日期 |
1996.06.05 |
申请人 |
H II HOLDINGS INC D B EE FUSE ELECTRON |
发明人 |
TAKIYUU RIYUU;CHIYAN NUGUIEN;MEERAN MATOROUBIAN |
分类号 |
H01L29/73;H01L21/203;H01L21/331;H01L29/201;H01L29/205;H01L29/737;(IPC1-7):H01L21/331 |
主分类号 |
H01L29/73 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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