发明名称 ALSB/INP SINGLE HETERO-JUNCTION TRANSISTOR ON INP SUBSTRATE FOR HIGH SPEED AND POWER
摘要 PROBLEM TO BE SOLVED: To provide the epitaxial structure of a single hetero-junction bipolar transistor using InP for a base and a collector and having high power capacity at high speed. SOLUTION: This transistor has a collector 18 composed of InP on a semiconductor supporter 20, a base 16 constituted of InP on the collector 18, and an emitter 12 on the base 16, and the emitter 12 is configured of approximately 39mol% AlP and approximately 61mol% AlSb. A gradient concentration distribution layer 14 is formed between the base 16 and the emitter 12.
申请公布号 JPH09106992(A) 申请公布日期 1997.04.22
申请号 JP19960143333 申请日期 1996.06.05
申请人 H II HOLDINGS INC D B EE FUSE ELECTRON 发明人 TAKIYUU RIYUU;CHIYAN NUGUIEN;MEERAN MATOROUBIAN
分类号 H01L29/73;H01L21/203;H01L21/331;H01L29/201;H01L29/205;H01L29/737;(IPC1-7):H01L21/331 主分类号 H01L29/73
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