发明名称 PHOTOSENSITIVE COMPOSITION
摘要 PROBLEM TO BE SOLVED: To obtain a photosensitive compsn. having superior alkali developability, satisfactory resolution and reproducibility by incorporating an acid-decomposable resin, an optical acid generating agent and specified naphthol novolak resin. SOLUTION: This photosensitive compsn. contains a resin having acid- decomposable groups, an optical acid generating agent and a naphthol novolak compd. whose mol.wt. is <=2,000. The acid-decomposable groups are, e.g. tert- butyl ester, tert-butoxycarbonyl, trimethylsilyl ether, trimethylsilyl ester, tetrahydropyranyl ether or tetrahydropyranyl ester. An arbitrary compd. generating an acid when irradiated with chemical radiation may be used as the optical acid geneating agent. The naphthol novolak compd. is a novolak compd. obtd. by condensing naphthol or its deriv. with a carbonyl compd.
申请公布号 JPH09127691(A) 申请公布日期 1997.05.16
申请号 JP19960221230 申请日期 1996.08.22
申请人 TOSHIBA CORP 发明人 GOKOCHI TORU;OKINO TAKASHI;ASAKAWA KOUJI;NAKASE MAKOTO;SHINODA NAOMI
分类号 C08L61/04;C08L61/10;G03F7/004;G03F7/023;G03F7/033;G03F7/038;G03F7/039;H01L21/027;(IPC1-7):G03F7/023 主分类号 C08L61/04
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