| 摘要 |
PROBLEM TO BE SOLVED: To adjust the deflection of a mask so as to perform accurate measuring and to prevent the sticking of foreign matters by forming a hermetically sealed space between a state and an exposure mask for exposing a photosensitive substrate and filling the space with fluids so as to adjust pressure. SOLUTION: An exposure mask 14 having a pattern 16 formed to be transferred to a photosensitive substrate is spported on a secondary state 32 by a mask holder 30 with its surface, on which the pattern 16 is formed, facing upward. A soft resin 44 formed into a frame shape is arranged on the upper surface of a frame 42 surrounding the mask 14 and a space 48 is formed by the upper surface of the stage 32, the inner side of the frame 42 and the back surface of the mask 14. The space 48 is pressurized by air from a pressure controller 52 via a hollow tube 50, the resin 44 is stuck to the back surface of the mask 14 and thereby the space 48 is hermetically sealed. By controlling pressure in the space 48, a state similar to the application of gravity to the mask back surface from the bottom is created and since measuring is performed under the same condition as that for its actual use in an exposing device, accurate measuring is performed. |
