Manufacturing method and fluid supply system for treating substrate

摘要

A method of manufacture and fluid supply system for treating a substrate is provided. The fluid supply system for treating a substrate may include a substrate dry part supplying a dry fluid to dry a rinse solution doped on a substrate; a dry fluid separation part retrieving a mixed fluid that the dry fluid and the rinse solution are mixed with each other during a dry process of the substrate from the substrate dry part and separating the dry fluid from the mixed fluid; and a dry fluid supply part resupplying the dry fluid separated from the dry fluid separation part to the substrate dry part.

主权项

1. A fluid supply system for treating a substrate comprising:
a process chamber configured to supply a supercritical fluid to a substrate to dry a rinse solution adhered to the substrate; a supercritical fluid separation unit configured to receive a mixed fluid comprising a mixture of the supercritical fluid and the rinse solution from the process chamber and configured to separate at least a portion of the supercritical fluid from the mixed fluid; and a supercritical fluid supply part configured to resupply the separated supercritical fluid to the process chamber, wherein the mixed fluid is maintained at a first pressure in the process chamber, and wherein the supercritical fluid separation unit comprises: a first separation part configured to reduce the pressure of the mixed fluid to a second pressure lower than the first pressure to change the phase of the supercritical fluid included in the mixed fluid to a phase different from the rinse solution and to perform an initial separation of the phase-changed supercritical fluid from the rinse solution to obtain an initially separated phase-changed supercritical fluid; and a second separation part configured to receive the initially separated phase-changed supercritical fluid and to pass the initially separated phase-changed supercritical fluid through an absorbent to perform a secondary separation of the supercritical fluid from the rinse solution, wherein the second separation part comprises: a first absorption container in which a first portion of the absorbent is provided; a second absorption container in which a second portion of the absorbent is provided; a retrieve pipe configured to retrieve the supercritical fluid separated from the first separation part, wherein one end of the retrieve pipe is connected to the first separation part and the other end is split into a first outlet and a second outlet and connected to the first absorption container with the first outlet and the second absorption container with the second outlet; a fluid supply control part configured to selectively supply the supercritical fluid to one of the first absorption container and the second absorption container, the fluid supply control part being installed at the retrieve pipe; a detector configured to measure purity of the supercritical fluid being discharged from the first absorption container and the second absorption container; and a controller configured to analyze impurities of the supercritical fluid in response to data provided from the detector and to control the fluid supply control part so that the supercritical fluid is supplied to one of the first and second absorption containers when it is determined that the other of the first and second absorption containers has unacceptable impurities.