发明名称 Target for magnetron cathode sputtering system consisting of a cobalt-base alloy
摘要 <p>1. In a target for magnetron sputtering apparatus of a cobalt-based alloy containing further elements in concentrations so that intermetallic phases are formed with at least one of these elements and intermetallic phases are observed in the equilibrium state at the operating temperature of the target because of the phase diagram, the grain boundaries, subgrain boundaries or slip bands of the cobalt solid solution forming the matrix are dressed with the elements forming the intermetallic phases, with the reflections in the X-ray diffraction pattern of the target showing an intermetallic phase which is essentially absent in the cast state and only forms on ignition in the temperature range below the solidus temperature of the alloy by a solid-state reaction.</p>
申请公布号 SG42750(A1) 申请公布日期 1997.10.17
申请号 SG19950000382 申请日期 1994.11.03
申请人 LEYBOLD MATERIAL GMBH 发明人 SCHLOTT MARTIN;WEIGERT MARTIN;TENG KWEI;GEHMAN BRUCE
分类号 C22C19/07;C23C14/14;C23C14/34;(IPC1-7):C23C14/34;C23C14/35 主分类号 C22C19/07
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